Open AccessHeated SC1 Solution for Selective Etching and Resist Particulate Removal
Author(s) -
S. D. Hossain,
M. F. Pas
Publication year - 1993
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2221133
Subject(s) - resist , etching (microfabrication) , materials science , particulates , oxide , chemical engineering , nitride , thermal , doping , nanotechnology , optoelectronics , chemistry , metallurgy , layer (electronics) , organic chemistry , engineering , physics , meteorology
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