Open AccessWet Etch Characteristics of Hafnium Silicate Layers
Author(s) -
Martine Claes,
Vasile Paraschiv,
Dries Dictus,
Thierry Conard,
Annelies Delabie,
Sven Van Elshocht,
Chao Zhao,
J.-L. Everaert,
Werner Boullart,
S. Vanhaelemeersch,
Stefan De Gendt
Publication year - 2006
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2171821
Subject(s) - silicate , materials science , hafnium , crystallization , nitriding , wafer , nitrogen , etching (microfabrication) , chemical vapor deposition , analytical chemistry (journal) , electrode , annealing (glass) , dielectric , layer (electronics) , chemical engineering , chemistry , metallurgy , optoelectronics , zirconium , composite material , environmental chemistry , organic chemistry , engineering
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