Open AccessAnodic Etching of Defects in P‐Type Silicon
Author(s) -
H. Föll
Publication year - 1980
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2130038
Subject(s) - etching (microfabrication) , isotropic etching , silicon , materials science , anode , optoelectronics , reactive ion etching , electrochemistry , voltage , nanotechnology , analytical chemistry (journal) , electrode , chemistry , electrical engineering , layer (electronics) , engineering , chromatography
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