Open AccessOn the Kinetics of the Thermal Oxidation of Silicon: II . Some Theoretical Evaluations
Author(s) -
William A. Tiller
Publication year - 1980
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2129723
Subject(s) - diffusion , kinetics , silicon , relaxation (psychology) , thermal oxidation , plane (geometry) , chemical physics , oxygen , activation energy , orientation (vector space) , materials science , interface (matter) , thermal , thermodynamics , chemistry , physics , geometry , optoelectronics , classical mechanics , psychology , social psychology , mathematics , organic chemistry , gibbs isotherm , adsorption
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