Open AccessEvaluation of Dislocation Generation on Silicon Substrates by Selective Oxidation
Author(s) -
Y. Tamaki,
Seiichi Isomae,
Shoichi Mizuo,
Hiroyoshi Higuchi
Publication year - 1983
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2119566
Subject(s) - dislocation , materials science , silicon , etching (microfabrication) , substrate (aquarium) , drop (telecommunication) , composite material , metallurgy , telecommunications , oceanography , layer (electronics) , computer science , geology
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