Open AccessMagnetron‐Sputtered SiO2 Films in Hydrogen‐Argon Mixtures
Author(s) -
T. Serikawa,
Toshiaki Yachi
Publication year - 1984
Publication title -
journal of the electrochemical society
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2116028
Subject(s) - argon , hydrogen , sputter deposition , sputtering , materials science , auger electron spectroscopy , thin film , substrate (aquarium) , analytical chemistry (journal) , cavity magnetron , chemistry , nanotechnology , organic chemistry , physics , oceanography , geology , nuclear physics
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