Open AccessA Novel Processing Technique for the Fabrication of Thick Silicon Grids by Anisotropic Etching
Author(s) -
Barbara Petit,
Jacques Pelletier,
R. Molins
Publication year - 1985
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2114000
Subject(s) - fabrication , etching (microfabrication) , materials science , silicon , anisotropy , engraving , optoelectronics , nanotechnology , composite material , optics , physics , medicine , alternative medicine , layer (electronics) , pathology
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