Passivation of Surfaces within Aluminum Etch Tunnels | Zendy

Bruce J. Wiersma | Zendy; Yongsug Tak | Zendy; Kurt R. Hebert | Zendy

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Passivation of Surfaces within Aluminum Etch Tunnels

Author(s) -

Bruce J. Wiersma,

Yongsug Tak,

Kurt R. Hebert

Publication year - 1991

Publication title -

journal of the electrochemical society

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.258

H-Index - 271

eISSN - 1945-7111

pISSN - 0013-4651

DOI - 10.1149/1.2085592

Subject(s) - passivation , dissolution , overpotential , materials science , cathodic protection , aluminium , current (fluid) , anode , etching (microfabrication) , metallurgy , electrode , composite material , chemistry , electrical engineering , electrochemistry , layer (electronics) , engineering

Transient events accompanying passivation of active surfaces in aluminum etch tunnels are investigated. Passivation is induced by pulsed reductions of the anodic etching current, of several milliseconds duration. Scanning electron microscopy is used to measure the area passivated. Potential transients are analyzed to identify a possible potential driving force for passivation

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