In Situ X‐Ray Absorption Study of Chromium Valency Changes in Passive Oxides on Sputtered AlCr Thin Films under Electrochemical Control | Zendy

Alison J. Davenport | Zendy; H.S. Isaacs | Zendy; G. S. Frankel | Zendy; A. G. Schrott | Zendy; C. Jahnes | Zendy; Michael A. Russak | Zendy

Open Access

In Situ X‐Ray Absorption Study of Chromium Valency Changes in Passive Oxides on Sputtered AlCr Thin Films under Electrochemical Control

Author(s) -

Alison J. Davenport,

H.S. Isaacs,

G. S. Frankel,

A. G. Schrott,

C. Jahnes,

Michael A. Russak

Publication year - 1991

Publication title -

journal of the electrochemical society

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.258

H-Index - 271

eISSN - 1945-7111

pISSN - 0013-4651

DOI - 10.1149/1.2085572

Subject(s) - valency , beamline , xanes , electrochemistry , synchrotron , chromium , absorption (acoustics) , materials science , chemistry , metallurgy , optics , physics , composite material , electrode , spectroscopy , philosophy , linguistics , beam (structure) , quantum mechanics

This work was carried out in part under the auspices of the US Department of Energy, Division of Materials Sciences, Office of Basic Energy Science under Contract No. DE-AC02-76CH00016. XANES measurements were carried out at the National Synchrotron Light Source Beamline X19A.

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