Open AccessRobust Reactive Ion Etching Processes for GaAs / AlGaAs / AlAs by Application of Statistical Concepts
Author(s) -
Gerhard Franz
Publication year - 1993
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2056214
Subject(s) - photoresist , reactive ion etching , etching (microfabrication) , chlorine , ion , chemistry , mixing (physics) , analytical chemistry (journal) , volumetric flow rate , aluminium , selectivity , materials science , composite material , mechanics , chromatography , organic chemistry , layer (electronics) , biochemistry , physics , quantum mechanics , catalysis
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