Open AccessCopper Dry Etching with Cl2 / Ar Plasma Chemistry
Author(s) -
J. W. Lee,
Y. D. Park,
J. R. Childress,
S. J. Pearton,
F. Sharifi,
F. Ren
Publication year - 1998
Publication title -
journal of the electrochemical society
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1838685
Subject(s) - chemistry , electron cyclotron resonance , ion , copper , chlorine , plasma , analytical chemistry (journal) , desorption , chromatography , adsorption , physics , organic chemistry , quantum mechanics
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