Open AccessFailure Mechanism of Amorphous and Crystalline Ta-N Films in the Cu/Ta-N/Ta/SiO[sub 2] Structure
Author(s) -
Ching-Chun Chang,
JenSue Chen,
Wu-Shiung Hsu
Publication year - 2004
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1803836
Subject(s) - sheet resistance , rutherford backscattering spectrometry , amorphous solid , annealing (glass) , materials science , diffusion barrier , diffraction , scanning electron microscope , analytical chemistry (journal) , composite material , chemical engineering , crystallography , thin film , layer (electronics) , nanotechnology , chemistry , optics , physics , engineering , chromatography
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