Open AccessAtomic Layer Deposition of Hafnium Silicate Thin Films Using HfCl[sub 2][N(SiMe[sub 3])[sub 2]][sub 2] and H[sub 2]O
Author(s) -
WonHee Nam,
ShiWoo Rhee
Publication year - 2004
Publication title -
electrochemical and solid-state letters
Language(s) - English
Resource type - Journals
eISSN - 1944-8775
pISSN - 1099-0062
DOI - 10.1149/1.1651392
Subject(s) - atomic layer deposition , hafnium , x ray photoelectron spectroscopy , materials science , silicate , deposition (geology) , thin film , analytical chemistry (journal) , substrate (aquarium) , layer (electronics) , chemical engineering , zirconium , nanotechnology , chemistry , metallurgy , organic chemistry , paleontology , oceanography , sediment , geology , engineering , biology
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