Surface Growth of Ni Thin Films Electrodeposited on Ni(100) Surfaces | Zendy

M. Saitou | Zendy; K. Hamaguchi | Zendy; Wataru Oshikawa | Zendy

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Surface Growth of Ni Thin Films Electrodeposited on Ni(100) Surfaces

Author(s) -

M. Saitou,

K. Hamaguchi,

Wataru Oshikawa

Publication year - 2003

Publication title -

journal of the electrochemical society

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.258

H-Index - 271

eISSN - 1945-7111

pISSN - 0013-4651

DOI - 10.1149/1.1539499

Subject(s) - exponent , scaling , dynamic scaling , materials science , instability , condensed matter physics , surface roughness , surface diffusion , surface finish , thin film , diffusion , chemical physics , crystallography , nanotechnology , chemistry , thermodynamics , geometry , physics , composite material , adsorption , mathematics , mechanics , philosophy , linguistics

Surface growth of Ni thin films electrodeposited on Ni(100) substrates has been investigated using atomic force microscopy. In the early stage of growth, islands nucleated on the Ni(100) substrates, which appear to be rectangular in cross section, grow laterally in the same crystallographic orientation. Growth surfaces display a normal scaling behavior characterized by the linear surface diffusion universality class. Along the time evolution, instability in growth occurs and a transition from two- to three-dimensional growth is observed. In this stage, surface growth obeys anomalous scaling characterized by a local roughness exponent zeta(loc) = 1.0, global scaling exponent zeta = 2.1, and dynamic exponent z = 1.0

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