Open AccessDeposition Condition and Pinhole Defect Density of CrN[sub x] (1 ≧ x ≧ 0) Thin Films Formed by Ion-Beam-Enhanced Deposition
Author(s) -
H. Kondo,
Noboru Akao,
Nobuyoshi Hara,
Katsuhisa Sugimoto
Publication year - 2003
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1536993
Subject(s) - pinhole (optics) , materials science , thin film , current density , ion beam , passivation , deposition (geology) , volumetric flow rate , ion beam deposition , analytical chemistry (journal) , focused ion beam , ion , beam (structure) , optics , composite material , chemistry , nanotechnology , layer (electronics) , paleontology , physics , organic chemistry , sediment , quantum mechanics , chromatography , biology
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