Open AccessPhotoresist Removal Using Low Molecular Weight Alcohols
Author(s) -
T. Kamal,
Dennis W. Hess
Publication year - 2000
Publication title -
journal of the electrochemical society
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1393600
Subject(s) - photoresist , x ray photoelectron spectroscopy , dissolution , silicon , materials science , contact angle , resist , analytical chemistry (journal) , polymer , chemical engineering , electrochemistry , chemistry , layer (electronics) , electrode , nanotechnology , composite material , organic chemistry , optoelectronics , engineering
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