Electrodeposition of Zinc-SiO[sub 2] Composite
Author(s) -
Kazuo Kondo,
Atsufumi Ohgishi,
Zennosuke Tanaka
Publication year - 2000
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1393577
Subject(s) - zinc , electrochemistry , composite number , materials science , chemical engineering , nanotechnology , metallurgy , chemistry , composite material , electrode , engineering
The incorporation mechanism of SiO2 particles into zinc electrodeposit is discussed. The SiO2 particles precipitate in two ways on the (00-1)(eta) of zinc electrodeposit: by lined up particles along the laterally growing macrosteps on the (00.1)(eta) and by randomly dispersed particles on the (00.1)(eta). These particles incorporate into the electrodeposits by following two processes. The sidewalls of particles are incorporated into the macrosteps at the edge of (00.1)(eta). The bottom of randomly dispersed particles are incorporated into the (00.1)(eta) probably by the atomic steps. (C) 2000 The Electrochemical Society.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom