Open AccessDeposition and Characterization of Undoped and Boron and Phosphorus Doped (Si[sub x]Ge[sub 1−x]O[sub 2]) Glass Films
Author(s) -
Darrell L. Simpson,
Robert T. Croswell,
Arnold Reisman,
C. K. Williams,
D. Temple
Publication year - 2000
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1393394
Subject(s) - germane , analytical chemistry (journal) , silane , boron , diborane , chemical vapor deposition , argon , boron oxide , phase (matter) , doping , chemistry , materials science , inorganic chemistry , silicon , germanium , metallurgy , nanotechnology , organic chemistry , optoelectronics
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