Open AccessAl x Ga1 − x As ( 111 ) A Substrate with Atomically Flat Polished Surface
Author(s) -
Yutaka Sawafuji,
Junichi Nishizawa
Publication year - 1999
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1392623
Subject(s) - surface roughness , aqueous solution , abrasion (mechanical) , materials science , surface finish , potassium hydroxide , sodium hydroxide , substrate (aquarium) , electrochemistry , analytical chemistry (journal) , sodium hypochlorite , inorganic chemistry , chemical engineering , chemistry , metallurgy , composite material , electrode , chromatography , oceanography , geology , organic chemistry , engineering
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