Open AccessComparison of Tetrakis(dimethylamido)titanium and Tetrakis(diethylamido)titanium as Precursors for Metallorganic Chemical Vapor Deposition of Titanium Nitride
Author(s) -
JuYoung Yun,
ManYoung Park,
ShiWoo Rhee
Publication year - 1999
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1391847
Subject(s) - tin , titanium , chemical vapor deposition , chemistry , differential scanning calorimetry , thermal decomposition , fourier transform infrared spectroscopy , thermal stability , inorganic chemistry , titanium nitride , analytical chemistry (journal) , nitride , organic chemistry , chemical engineering , layer (electronics) , physics , engineering , thermodynamics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom