Open AccessLow Temperature Chemical Vapor Deposition of (Ba, Sr)TiO[sub 3] Thin Films with Ti(mpd)(tmhd)[sub 2] as a Ti Source
Author(s) -
Junghyun Lee,
ShiWoo Rhee
Publication year - 2001
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1368103
Subject(s) - chemical vapor deposition , thin film , methanol , materials science , electrochemistry , wafer , solvent , thermal stability , deposition (geology) , combustion chemical vapor deposition , chemical engineering , inorganic chemistry , analytical chemistry (journal) , chemistry , electrode , nanotechnology , carbon film , organic chemistry , sediment , paleontology , engineering , biology
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