Etch Characteristics of Cr by Using Cl[sub 2]/O[sub 2] Gas Mixtures with Electron Cyclotron Resonance Plasma
Author(s) -
SeungYoul Kang,
KwangHo Kwon,
Sung-Ihl Kim,
Sangkyun Lee,
MoonYoun Jung,
YoungRae Cho,
YoonHo Song,
Jin Ho Lee,
Kyoung-Ik Cho
Publication year - 2001
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.1359204
Subject(s) - x ray photoelectron spectroscopy , chromium , analytical chemistry (journal) , electron cyclotron resonance , emission spectrum , spectroscopy , plasma , chemistry , materials science , spectral line , nuclear magnetic resonance , ion , physics , chromatography , organic chemistry , astronomy , quantum mechanics
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