Open Access(Invited) Effect of the Plasma Etching on InAsP/InP Quantum Well Structures Measured through Low Temperature Micro-Photoluminescence and Cathodoluminescence
Author(s) -
Jean-Pierre Landesman,
Nebile Işık Göktaş,
Ray LaPierre,
Shahram Ghanad-Tavakoli,
E. Pargon,
Camille PetitEtienne,
Christophe Levallois,
J. Jiménez,
Shabnam Dadgostar
Publication year - 2020
Publication title -
ecs transactions
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.235
H-Index - 52
eISSN - 1938-6737
pISSN - 1938-5862
DOI - 10.1149/09702.0043ecst
Subject(s) - cathodoluminescence , photoluminescence , etching (microfabrication) , quantum well , luminescence , materials science , plasma , analytical chemistry (journal) , optoelectronics , plasma etching , chemistry , optics , laser , nanotechnology , physics , layer (electronics) , quantum mechanics , chromatography
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