Open Access(Invited) Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in-Plane Anisotropic ITO Thin Films
Author(s) -
Julián ParraBarranco,
Juan R. SánchezValencia,
Francisco J. Aparicio,
F.J. García-García,
Francisco J. Ferrer,
Víctor Rico,
Carmen LópezSantos,
Ana Borrás,
Agustín R. GonzálezElipe,
Ángel Barranco
Publication year - 2017
Publication title -
ecs transactions
Language(s) - English
Resource type - Journals
eISSN - 1938-6737
pISSN - 1938-5862
DOI - 10.1149/07703.0009ecst
Subject(s) - materials science , fabrication , indium tin oxide , thin film , deposition (geology) , microstructure , plasma , nanostructure , nanotechnology , transparent conducting film , optoelectronics , composite material , geology , medicine , paleontology , alternative medicine , physics , pathology , quantum mechanics , sediment
Oblique angle deposition (OAD) is a powerful technique for the fabrication of porous nanostructured oxide thin films. OAD films typically present a columnar tilted nanostructure due to geometrical shadowing effects during the thin film growth. In this work, we study the fabrication of transparent and conducting indium tin oxide films (ITO) by OAD assisted by a microwave ECR plasma. The objective of assisting the deposition with a plasma discharge is to modify the growth mechanism of the OAD process introducing additional parameters to control the columnar microstructure, composition, porosity of the films. The results indicate the OAD ITO deposition assisted by the plasma discharge is a very effective process to develop in-plane structural anisotropy in the ITO nanocolumnar films what determines their electrical properties.
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