OCD Measurement with the Illuminated Light Spot Size Being Larger than the Grating Region | Zendy

ZhenSheng Zhang | Zendy; Xin Wang | Zendy; JiangTao Dang | Zendy; LI Hai-tao | Zendy; Yaoming Shi | Zendy; Feng Yang | Zendy; Yiping Xu | Zendy

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OCD Measurement with the Illuminated Light Spot Size Being Larger than the Grating Region

Author(s) -

ZhenSheng Zhang,

Xin Wang,

JiangTao Dang,

LI Hai-tao,

Yaoming Shi,

Feng Yang,

Yiping Xu

Publication year - 2013

Publication title -

ecs transactions

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.235

H-Index - 52

eISSN - 1938-6737

pISSN - 1938-5862

DOI - 10.1149/05201.0819ecst

Subject(s) - grating , mueller calculus , reflectometry , optics , ellipsometry , materials science , matrix (chemical analysis) , physics , thin film , nanotechnology , polarimetry , scattering , time domain , computer science , composite material , computer vision

This work studied the case that the illumination light spot size is larger than the grating region during optical critical dimension (OCD) measurement. The analysis is based on Mueller matrix formulism. The total Mueller matrix output is the combination of both the grating Mueller matrix contribution and the surrounding film Mueller matrix contribution. The spectroscopic reflectometry (SR) and spectroscopic ellipsometry (SE) outputs are calculated from total Mueller matrix elements. The measurements with different ratios of illuminated grating area to illuminated film area are carried out. The measured spectra coincide well with the simulated ones. The work will be useful for IC industry, as the measurement pad size becomes even smaller.

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