Open AccessA Miniature Micro-Machined Millimeter-Wave Bandpass Filter By Complementary Metal–Oxide–Semiconductor Compatible Inductively-Coupled-Plasma Deep-Trench Technology
Author(s) -
JinFa Chang,
YoSheng Lin,
ChiChih Chen,
Changzhi Chen,
Tao Wang,
SheyShi Lu
Publication year - 2008
Publication title -
japanese journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.1143/jjap.47.68
Subject(s) - materials science , optoelectronics , return loss , insertion loss , inductor , inductively coupled plasma , capacitor , cmos , band pass filter , etching (microfabrication) , plasma , electrical engineering , optics , nanotechnology , physics , layer (electronics) , quantum mechanics , voltage , antenna (radio) , engineering
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