Field-Effect Transistor with Deposited Graphite Thin Film
Author(s) -
Hiroshi Inokawa,
Masao Nagase,
Shigeru Hirono,
Touichiro Goto,
Hiroshi Yamaguchi,
Keiichi Torimitsu
Publication year - 2007
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.1143/jjap.46.2615
Subject(s) - ambipolar diffusion , graphite , materials science , thin film , enhanced data rates for gsm evolution , field (mathematics) , electron cyclotron resonance , field effect transistor , sputtering , transistor , sputter deposition , optoelectronics , analytical chemistry (journal) , condensed matter physics , electron , nanotechnology , chemistry , electrical engineering , composite material , physics , telecommunications , mathematics , engineering , quantum mechanics , voltage , chromatography , computer science , pure mathematics
By using a bottom-gate top-contact field-effect transistor structure, the field effect of graphite-rich carbon nanocrystallite thin films deposited by electron cyclotron resonance sputtering was investigated. An appreciable ambipolar field effect was observed at the film edge where the thickness was vanishing. On–off current ratios of 2 and 7 were attained at 294 and 150 K, respectively.
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