Open AccessUltimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching
Author(s) -
Seiji Samukawa
Publication year - 2006
Publication title -
japanese journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.1143/jjap.45.2395
Subject(s) - etching (microfabrication) , nanoscopic scale , plasma etching , materials science , fabrication , nanotechnology , optoelectronics , reactive ion etching , isotropic etching , resist , plasma , layer (electronics) , physics , medicine , alternative medicine , pathology , quantum mechanics
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