Open AccessPorous Materials with Ultralow Optical Constants for Integrated Optical Device Applications
Author(s) -
HsuenLi Chen,
Chung-I Hsieh,
Chao-Chia Cheng,
Chia-Pin Chang,
Wen-Hau Hsu,
WaySeen Wang,
PoTsun Liu
Publication year - 2005
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.1143/jjap.44.5673
Subject(s) - materials science , cladding (metalworking) , refractive index , dielectric , optoelectronics , silicon nitride , optics , silicon oxynitride , wavelength , porous silicon , waveguide , silicon , composite material , physics
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