Open Access“Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks”
Author(s) -
Taro Ogawa,
Masaaki Ito,
Masashi Takahashi,
Hiromasa Hoko,
Hiromasa Yamanashi,
E. Hoshino,
Shinji Okazaki,
Keiichi Sekine,
I. Kataoka
Publication year - 2002
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.1143/jjap.41.4031
Subject(s) - extreme ultraviolet lithography , materials science , transmission electron microscopy , extreme ultraviolet , coating , molybdenum , lithography , optics , optoelectronics , silicon , ultraviolet , electron microscope , nanotechnology , physics , metallurgy , laser
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