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Atomic-resolution transmission electron microscopy of electron beam–sensitive crystalline materials
Author(s) -
Daliang Zhang,
Yihan Zhu,
Lingmei Liu,
Xiangrong Ying,
ChiaEn Hsiung,
Rachid Sougrat,
Kun Li,
Yu Han
Publication year - 2018
Publication title -
science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 12.556
H-Index - 1186
eISSN - 1095-9203
pISSN - 0036-8075
DOI - 10.1126/science.aao0865
Subject(s) - transmission electron microscopy , electron microscope , resolution (logic) , energy filtered transmission electron microscopy , cathode ray , scanning confocal electron microscopy , conventional transmission electron microscope , materials science , high resolution transmission electron microscopy , electron tomography , electron , scanning transmission electron microscopy , electron beam induced deposition , optics , nanotechnology , physics , computer science , nuclear physics , artificial intelligence
High-resolution imaging of electron beam-sensitive materials is one of the most difficult applications of transmission electron microscopy (TEM). The challenges are manifold, including the acquisition of images with extremely low beam doses, the time-constrained search for crystal zone axes, the precise image alignment, and the accurate determination of the defocus value. We develop a suite of methods to fulfill these requirements and acquire atomic-resolution TEM images of several metal organic frameworks that are generally recognized as highly sensitive to electron beams. The high image resolution allows us to identify individual metal atomic columns, various types of surface termination, and benzene rings in the organic linkers. We also apply our methods to other electron beam-sensitive materials, including the organic-inorganic hybrid perovskite CH 3 NH 3 PbBr 3 .

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