Ultrahigh-mobility graphene devices from chemical vapor deposition on reusable copper
Author(s) -
Luca Banszerus,
M. Schmitz,
Stephan Engels,
Jan Dauber,
Martin Oellers,
Federica Haupt,
Kenji Watanabe,
Takashi Taniguchi,
Bernd Beschoten,
Christoph Stampfer
Publication year - 2015
Publication title -
science advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.928
H-Index - 146
ISSN - 2375-2548
DOI - 10.1126/sciadv.1500222
Subject(s) - chemical vapor deposition , graphene , copper , materials science , nanotechnology , deposition (geology) , chemical engineering , metallurgy , paleontology , sediment , engineering , biology
Graphene research has prospered impressively in the past few years, and promising applications such as high-frequency transistors, magnetic field sensors, and flexible optoelectronics are just waiting for a scalable and cost-efficient fabrication technology to produce high-mobility graphene. Although significant progress has been made in chemical vapor deposition (CVD) and epitaxial growth of graphene, the carrier mobility obtained with these techniques is still significantly lower than what is achieved using exfoliated graphene. We show that the quality of CVD-grown graphene depends critically on the used transfer process, and we report on an advanced transfer technique that allows both reusing the copper substrate of the CVD growth and making devices with mobilities as high as 350,000 cm(2) V(-1) s(-1), thus rivaling exfoliated graphene.
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