Open AccessLaser-induced gas plasma etching of fused silica under ambient conditions
Author(s) -
Selim Elhadj,
Gabe Guss,
Manyalibo J. Matthews,
Isaac L. Bass
Publication year - 2012
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.979814
Subject(s) - etching (microfabrication) , materials science , reactive ion etching , laser , plasma , surface roughness , plasma etching , surface finish , substrate (aquarium) , optics , thermal , optoelectronics , residual stress , machining , composite material , layer (electronics) , metallurgy , oceanography , physics , quantum mechanics , meteorology , geology
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