Open AccessPerformance of Oblique Angle of Incidence Collection Systems in the VUV
Author(s) -
Geza L. Keller,
Marion L. Scott,
Kenneth Mitchell
Publication year - 1986
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.936586
Subject(s) - extreme ultraviolet lithography , optical filter , optics , materials science , range (aeronautics) , computer science , oblique case , physics , linguistics , philosophy , composite material
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