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Single-grain Si TFTs for high-speed flexible electronics
Author(s) -
Ryoichi Ishihara,
Tao Chen,
Michiel van der Zwan,
Ming He,
H. Schellevis,
Kees Beenakker
Publication year - 2011
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.876649
Subject(s) - materials science , thin film transistor , optoelectronics , transistor , electronic circuit , flat panel display , electronics , crystallization , semiconductor , electrical engineering , nanotechnology , layer (electronics) , voltage , chemistry , engineering , organic chemistry
Existent flat-panel display is mechanically stiff because it requires external connection of IC chips. At its present stage, displays with a-Si, metal oxide semiconductor or organic TFTs require still external connection of data driver and controllers, because of their low carrier mobilities. We will review our recent progress on direct formation of high speed Si circuits fabricated with a plastic compatible temperature. Large Si grains with a diameter of 4 microns were formed on predetermined positions by a pulsed laser crystallization process with a plastic compatible temperature. High performance transistors were fabricated inside a single Si grain

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