CMOS-compatible LVOF-based visible microspectrometer
Author(s) -
A. Emadi,
Huaiwen Wu,
G. de Graaf,
R.F. Wolffenbuttel
Publication year - 2010
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.849844
Subject(s) - fabrication , materials science , optoelectronics , lithography , resist , wafer , dielectric , spectrometer , cmos , photodiode , stack (abstract data type) , etching (microfabrication) , optics , layer (electronics) , nanotechnology , physics , computer science , medicine , alternative medicine , pathology , programming language
This paper reports on a CMOS-Compatible Linear Variable Optical Filter (LVOF) visible micro-spectrometer. The CMOS-compatible post process for fabrication of the LVOF has been used for integration of the LVOF with a CMOS chip containing a 128-element photodiode array and readout circuitry. Fabrication of LVOF involves a process for fabrication of very small taper angles, ranging from 0.001° to 0.1°, in SiO2. These layers can be fabricated flexibly in a resist layer by just one lithography step and a subsequent reflow process. The 3D pattern of the resist structures is subsequently transferred into SiO2 by appropriate etching. Complete LVOF fabrication involves CMOS-compatible deposition of a lower dielectric mirror using a stack of dielectrics on the wafer, tapered layer formation and deposition of the top dielectric mirror. The LVOF has been optimized for 580 nm - 720 nm spectral operating range and has also been mounted on a CCD camera for characterization. The design of LVOF micro-spectrometer, the fabrication and characterization results are presented.
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