Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO 3 waveguide | Zendy

Kamal Ghoumid | Zendy; Régis Ferrière | Zendy; Badr-Eddine Benkelfat | Zendy; Gwenn Ulliac | Zendy; Roland Salut | Zendy; JeanYves Rauch | Zendy; Tijani Gharbi | Zendy

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Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO 3 waveguide

Author(s) -

Kamal Ghoumid,

Régis Ferrière,

Badr-Eddine Benkelfat,

Gwenn Ulliac,

Roland Salut,

JeanYves Rauch,

Tijani Gharbi

Publication year - 2009

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.839692

Subject(s) - materials science , etching (microfabrication) , optics , transmittance , bandwidth (computing) , waveguide , optoelectronics , ion , reactive ion etching , beam (structure) , layer (electronics) , chemistry , nanotechnology , computer science , telecommunications , physics , organic chemistry

International audienceIn this paper we have studied effect of depth etching on the Bragg gratings (BGs) realized by Focused Ions Beam. This technique has the advantage to induce a direct waveguide structuring without intermediate media, comparing to traditional methods. A reflectivity of 96% within a window centred at 1550 nm is obtained. The effect of the depth etching on the transmittance and the bandwidth at half maximum is demonstrated

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