Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography | Zendy

Adam J. Berro | Zendy; Xinyu Gu | Zendy; Naphtali O’Connor | Zendy; Steffen Jockusch | Zendy; Tomoki Nagai | Zendy; Toshiyuki Ogata | Zendy; Paul Zimmerman | Zendy; Bryan J. Rice | Zendy; Elizabeth Adolph | Zendy; Travis Byargeon | Zendy; José C. GonzálezGómez | Zendy; Nicholas J. Turro | Zendy; C. Grant Willson | Zendy

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Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography

Author(s) -

Adam J. Berro,

Xinyu Gu,

Naphtali O’Connor,

Steffen Jockusch,

Tomoki Nagai,

Toshiyuki Ogata,

Paul Zimmerman,

Bryan J. Rice,

Elizabeth Adolph,

Travis Byargeon,

José C. GonzálezGómez,

Nicholas J. Turro,

C. Grant Willson

Publication year - 2009

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.814295

Subject(s) - azobenzene , lithography , polymer , materials science , molecule , layer (electronics) , optoelectronics , nanotechnology , chemistry , organic chemistry , composite material

Intermediate state two-photon (ISTP) photoacid generator (PAG) and optical threshold layer (OTL) approaches to double exposure lithography have been explored. We have synthesized "transparent" PAG and sensitizer compounds for use in ISTP systems and have demonstrated the possibility of utilizing such energy transfer systems to generate acid. We have also synthesized side chain liquid crystalline polymers and small molecule azobenzene compounds for use in OTL applications and have begun photoswitching studies.

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