Anti-reflective coating for multipatterning lithography | Zendy

Douglas J. Guerrero | Zendy; Stephen Gibbons | Zendy; Joyce Lowes | Zendy; Ramil Mercado | Zendy

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Anti-reflective coating for multipatterning lithography

Author(s) -

Douglas J. Guerrero,

Stephen Gibbons,

Joyce Lowes,

Ramil Mercado

Publication year - 2008

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.772827

Subject(s) - resist , trench , lithography , materials science , scanner , anti reflective coating , coating , etching (microfabrication) , photolithography , optoelectronics , nanotechnology , photoresist , optics , physics , layer (electronics)

New bottom anti-reflective coatings (BARCs) have been developed that can be incorporated into multiple patterning schemes utilizing scanner-track-only processes. The BARCs have modifiable optical properties and can be removed during the resist development step. Several dual patterning schemes were investigated for trench printing. The most promising process produced 110 nm trenches with approximately 1:1 space ratios. The etch characteristics of these BARCs under fluorinated and oxygenated gases were determined.

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