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Recent progress on GaN-based vertical cavity surface emitting lasers
Author(s) -
TienChang Lu,
C. C. Kao,
G. S. Huang,
HaoChung Kuo,
S. C. Wang
Publication year - 2007
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.729281
Subject(s) - materials science , optoelectronics , laser linewidth , laser , dielectric , vertical cavity surface emitting laser , epitaxy , semiconductor laser theory , active layer , distributed bragg reflector laser , optics , layer (electronics) , semiconductor , nanotechnology , physics , thin film transistor
We report the recent progress of GaN-based VCSELs with two different laser structures. One is a hybrid cavity structure comprised an epitaxial AlN/GaN DBR, an InGaN/GaN MQW active region and a top dielectric DBR. Another is a dielectric cavity structure comprised an InGaN/GaN MQW layer sandwiched by two dielectric DBRs. Both lasers achieved laser action under optical pumping at the room temperature with narrow linewidth. The detailed characteristics of VCSELs will be reported. The status of the electrically pumped VCSEL will also be presented.

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