Open AccessEUV MET printing and actinic imaging analysis on the effects of phase defects on wafer CDs
Author(s) -
Hak-Seung Han,
Kenneth A. Goldberg,
Anton Barty,
Eric M. Gullikson,
Yoshiaki Ikuta,
Toshiyuki Uno,
Obert R. Wood,
Stefan Wurm
Publication year - 2007
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.711166
Subject(s) - extreme ultraviolet lithography , materials science , extreme ultraviolet , wafer , lithography , optics , critical dimension , substrate (aquarium) , optoelectronics , photolithography , line (geometry) , laser , physics , oceanography , geometry , mathematics , geology
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