Evanescent wave imaging in optical lithography | Zendy

Bruce W. Smith | Zendy; Yongfa Fan | Zendy; Jianming Zhou | Zendy; Neal Lafferty | Zendy; Andrew Estroff | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Evanescent wave imaging in optical lithography

Author(s) -

Bruce W. Smith,

Yongfa Fan,

Jianming Zhou,

Neal Lafferty,

Andrew Estroff

Publication year - 2006

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.657322

Subject(s) - photomask , superlens , optics , evanescent wave , lithography , photoresist , photolithography , materials science , refractive index , excimer laser , optoelectronics , wavelength , interference (communication) , interference lithography , laser , resist , physics , fabrication , nanotechnology , computer science , layer (electronics) , medicine , computer network , channel (broadcasting) , alternative medicine , pathology

New applications of evanescent imaging for microlithography are introduced. The use of evanescent wave lithography (EWL) has been employed for 26nm resolution at 1.85NA using a 193nm ArF excimer laser wavelength to record images in a photoresist with a refractive index of 1.71. Additionally, a photomask enhancement effect is described using evanescent wave assist features (EWAF) to take advantage of the coupling of the evanescent energy bound at the substrate-absorber surface, enhancing the transmission of a mask opening through coupled interference.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research