Open AccessA dual-mode actinic EUV mask inspection tool
Author(s) -
Yanwei Liu,
Anton Barty,
Eric M. Gullikson,
John S. Taylor,
J. Alexander Liddle,
Obert R. Wood
Publication year - 2005
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.598559
Subject(s) - extreme ultraviolet lithography , optics , extreme ultraviolet , beamline , synchrotron radiation , metrology , field of view , physics , materials science , laser , beam (structure)
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