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Actinic inspection of multilayer defects on EUV masks
Author(s) -
Anton Barty,
Yanwei Liu,
Eric M. Gullikson,
John S. Taylor,
Obert R. Wood
Publication year - 2005
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.598488
Subject(s) - extreme ultraviolet lithography , optics , lithography , blank , extreme ultraviolet , computer science , automated optical inspection , materials science , metrology , detector , artificial intelligence , physics , laser , composite material

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