OPC and image optimization using localized frequency analysis | Zendy

Bruce W. Smith | Zendy; Dale E. Ewbank | Zendy

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OPC and image optimization using localized frequency analysis

Author(s) -

Bruce W. Smith,

Dale E. Ewbank

Publication year - 2002

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.474509

Subject(s) - computer science , flexibility (engineering) , focus (optics) , feature (linguistics) , process (computing) , spatial frequency , bar (unit) , energy (signal processing) , function (biology) , image (mathematics) , frequency response , artificial intelligence , computer vision , optics , electrical engineering , linguistics , statistics , physics , philosophy , mathematics , evolutionary biology , meteorology , biology , engineering , operating system

A method of assist feature OPC layout is introduced using a frequency model-based approach. Through low-pass spatial frequency filtering of a mask function, the local influence of zero diffraction energy can be determined. By determining isofocal intensity threshold requirements of an imaging process, a mask equalizing function can be designed. This provides the basis for frequency model-based assist feature layout. By choosing assist bar parameters that meet the requirements of the equalizing function, through-pitch focus and dose matching is possible for large two dimensional mask fields. The concepts introduced also lead to additional assist feature options and design flexibility.

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