Open Access100-picometer interferometry for EUVL
Author(s) -
Gary E. Sommargren,
D. W. Phillion,
Michael Johnson,
Nhan Nguyen,
Anton Barty,
Franklyn J. Snell,
Daren Dillon,
Lloyd S. Bradsher
Publication year - 2002
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.472305
Subject(s) - optics , interferometry , extreme ultraviolet lithography , metrology , diffraction , physics , lithography , focus (optics) , extreme ultraviolet , curved mirror , wavelength , laser , computer science
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