Open AccessAdvances in low-defect multilayers for EUVL mask blanks
Author(s) -
James A. Folta,
Jordan Davidson,
Cindy Larson,
Christopher Walton,
Patrick A. Kearney
Publication year - 2002
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.472287
Subject(s) - materials science , extreme ultraviolet lithography , coating , wafer , substrate (aquarium) , resist , optoelectronics , sputtering , etching (microfabrication) , blank , deposition (geology) , optics , layer (electronics) , composite material , nanotechnology , thin film , oceanography , physics , geology , paleontology , sediment , biology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom