Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution | Zendy

Régina Soufli | Zendy; Eberhard Spiller | Zendy; Mark Schmidt | Zendy; Courtney Davidson | Zendy; R. Fred Grabner | Zendy; Eric M. Gullikson | Zendy; B. Kaufmann | Zendy; Stanley Mrowka | Zendy; Sherry L. Baker | Zendy; Henry N. Chapman | Zendy; Russell M. Hudyma | Zendy; John S. Taylor | Zendy; Christopher Walton | Zendy; Claude Montcalm | Zendy; James A. Folta | Zendy

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<title>Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution</title>

Author(s) -

Régina Soufli,

Eberhard Spiller,

Mark Schmidt,

Courtney Davidson,

R. Fred Grabner,

Eric M. Gullikson,

B. Kaufmann,

Stanley Mrowka,

Sherry L. Baker,

Henry N. Chapman,

Russell M. Hudyma,

John S. Taylor,

Christopher Walton,

Claude Montcalm,

James A. Folta

Publication year - 2001

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.436695

Subject(s) - extreme ultraviolet lithography , optics , extreme ultraviolet , materials science , sputter deposition , lithography , optical coating , wavelength , sputtering , optoelectronics , adaptive optics , photolithography , physics , thin film , nanotechnology , laser

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