Open AccessChemical etch effects on laser-induced surface damage growth in fused silica
Author(s) -
Lawrence W. Hrubesh,
Mary A. Norton,
William A. Molander,
Paul J. Wegner,
Michael C. Staggs,
Stavros G. Demos,
Jerald A. Britten,
L. Summers,
E. F. Lindsey,
Mark R. Kozlowski
Publication year - 2001
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.425054
Subject(s) - etching (microfabrication) , fluorescence , laser , materials science , isotropic etching , scanning electron microscope , etch pit density , optoelectronics , optics , analytical chemistry (journal) , nanotechnology , composite material , chemistry , layer (electronics) , environmental chemistry , physics
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