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<title>Pulsed rf breakdown studies</title>
Author(s) -
L. Laurent,
G. Caryotakis,
G. Scheitrum,
D. Sprehn,
Neville C. Luhmann
Publication year - 2000
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.391793
Subject(s) - pulsed power , microwave , materials science , plasma , pulse duration , power (physics) , optoelectronics , residual , rf power amplifier , nuclear engineering , electrical engineering , environmental science , physics , engineering , computer science , nuclear physics , optics , telecommunications , voltage , amplifier , cmos , algorithm , quantum mechanics , laser
A series of experiments have been conducted to investigate the critical mechanisms involved in pulsed rf breakdown. This research has examined fundamental issues such as microparticle contamination, grain boundaries, residual gas, pulse duration, field emission, and the spatial distribution of plasma during a breakdown event. The motivation of this research is to gain a clearer understanding of the processes involved in breakdown and to determine methods to increase the breakdown threshold thereby increasing the available power in high power microwave sources and accelerator components.

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